+44 (0)24 7671 8970
More publications     •     Advertise with us     •     Contact us
 
Loading...
News Article

IBM and Synopsys Accelerate Post-FinFET Process Development

News

Synopsys has announced a collaboration with IBM to apply design technology co-optimization (DTCO) to the pathfinding of new semiconductor process technologies for post-FinFET technologies. DTCO is a methodology for efficiently evaluating and down-selecting new transistor architectures, materials and other process technology innovations using design metrics, starting with an early pathfinding phase before wafers become available. The collaboration will extend the current Synopsys DTCO tool flow to new transistor architectures and other technology options while enabling IBM to develop early process design kits (PDKs) for its partners to assess the power, performance, area, and cost (PPAC) benefits at IBM's advanced nodes.

"Process technology development beyond 7 nanometers requires the exploration of new materials and transistor architectures to achieve optimum manufacturability, power, performance, area, and cost. A major challenge for foundries is to converge on the best architecture in a timely manner while vetting all the possible options," said Dr. Mukesh Khare, vice president of Semiconductor Research, IBM Research Lab. "Our DTCO collaboration with Synopsys allows us to efficiently select the best transistor architecture and process options based on metrics derived from typical building blocks, such as CPU cores, thus contributing to faster process development at reduced cost."

In this collaboration, IBM and Synopsys are developing and validating new patterning techniques with Proteus mask synthesis, modeling new materials with QuantumATK, optimizing new transistor architectures with Sentaurus TCAD and Process Explorer, and extracting compact models with Mystic. Design rules and process assumptions derived from these process innovations are used to design and characterize a standard cell library while Fusion Technology at the block level using the Synopsys physical implementation flow based on IC Compiler II place-and-route, StarRC extraction, SiliconSmart characterization, PrimeTime signoff, and IC Validator physical verification benefits the evaluation of PPAC.

"Synopsys has developed the only complete DTCO solution, from materials exploration to block-level physical implementation," said Dr. Antun Domic, chief technology officer at Synopsys. "IBM's extensive process development and design know-how makes them an ideal partner for extending our DTCO solution to post-FinFET technologies."

Laser focus on Glasgow
Kaman Measuring introduces ThreadChecker
SandBox Semiconductor adds hybrid metrology capabilities
Intel empowers developers to 'Bring AI Everywhere'
Fab renovation: A blue CHIPS investment
Aqua Membranes collaborates with Micron Technology
Brewer Science releases Impact Report 2023
UK semiconductor strategy: A patent attorney’s perspective
Wafer cleaning market to reach US$ 17.2 billion
Solvay signs partnership agreement with Shengjian
ACM cleaning platform targets chiplets industry
Vietnam's thriving semiconductor industry fuels economic resilience
GSA celebrates women's innovation
The need for geofencing to help improve semiconductor IP security
All roads lead to Arizona
Time to celebrate and accelerate diversity, equity and inclusion
Cadence completes acquisition of PHY IP assets from Rambus
Wales joins the European Semiconductor Regional Alliance
Magnachip targets EV market
Greene Tweed: When it can’t fail
Advanced Packaging market Size to reach $66.9 billion by 2032
Inventec and Renesas to develop PoC for automotive gateways
Renesas commences Sequans tender offer
Tower Semiconductor and InnoLight partner
Flanders Semiconductors - a new hub in the heart of Europe
Ambiq wins Demo of the Year Award
Advanced packaging market nears US$90 billion
Intel Foundry Services and Tower Semiconductor reach US foundry agreement
MediaTek develops first chip using TSMC's 3nm Process
Advanced X-ray technology for advanced packaging
New developments in underlayers and their role in advancing EUV lithography
Advanced SAM validates integrity of electrostatic chucks
×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: