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Leti Develops μLED Fabrication Process For High-resolution Arrays

Leti has developed a μLED fabrication process for high-resolution arrays at 10-micron pitch. That pixelization and the 873 x 500 resolution that are enabled by the new process exceed state-of-the-art technology "“ see news release below.

Designed for micro-display applications such as augmented-reality or virtual-reality tools and wearable devices, the blue or green GaN/InGaN µLED arrays use Leti's proprietary self-aligned technology, which is key to achieving such a small pixel pitch.

"Leti's self-aligned process allows the creation of high-resolution µLED matrices with a reduced pixel pitch of 10 µm and paves the way towards even smaller pitches for next-generation devices," said Ludovic Dupré, one of the authors of the paper that was presented at Photonics West.



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Panasonic Microelectronics Web Seminar
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