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Full Range Of Dry Roots Process Pumps For Harsh Duty Applications (XN Series)

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New XN models feature :

- Advanced materials for full corrosion resistance

- New integrated options for increased pump health monitoring capabilities and extending pump service intervals

- Extended process lifetime

- Low power consumption


A 3004: The new standard for 3000 m3/h pumping speed - CVD Applications - Highest performance at the lowest operating cost

On the most advanced CVD applications, the A 3004 pump offers the best compression ratio under process flow operation for a wider process window.

Customer benefits

§ Better Tool uptime

o High MTBF

o Full corrosion resistant materials

o Wide operating temperature range

o Integrated hot N2 injection prevents exhaust clogging

§ Savings

o Low power consumption

o Low cost of ownershi

o High efficiency motors

o Optimized electrical heaters

§ Intelligent

o Extended monitoring functionalities provide better control of pump conditions (water sensor, vibration box)

§ IP33, Semi S2 and UL compliant

Applications

  • Semiconductor industry (Etch, PECVD, SACVD, ALD, ...)
  • Coating industry: Displays, Photovoltaic & LED


Pfeiffer Vacuum

Nashua, NH

www.pfeiffer-vacuum.com

Tel: 1-603-578-6500

E-mail: contact@pfeiffer-vacuum.com

Link: https://www.pfeiffer-vacuum.com/en/products/vacuum-generation/multi-stage-roots-pumps/harsh-duty-applications/a4x-series/

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