New centre for semiconductor research in Dresden

With the establishment of the Center for Advanced CMOS & Heterointegration Saxony, the Fraunhofer Institute for Photonic Microsystems IPMS and the “All Silicon System Integration Dresden - ASSID “ branch of Fraunhofer IZM are pooling their expertise in semiconductor research.

BY MARTIN LANDGRAF, BUSINESS DEVELOPMENT, KONRAD SEIDEL, GROUP LEADER EMERGING MEMORIES, AND ROBERT KRAUSE, PROJECT MANAGER AND PROCESS ENGINEER, AT FRAUNHOFER IPMS.

With the establishment of the Center for Advanced CMOS & Heterointegration Saxony, the Fraunhofer Institute for Photonic Microsystems IPMS and the “All Silicon System Integration Dresden - ASSID “ branch of Fraunhofer IZM are pooling their expertise in semiconductor research.

In the future, they will offer the complete value chain in 300 mm microelectronics and thus the prerequisite for high-tech research in future technologies with international reach. The 300 mm wafer industry standard is crucial in this context, because on the one hand it is the only way to ensure a rapid transfer of research results to the semiconductor industry in Saxony, nationwide and also worldwide. On the other hand, this wafer standard is a basic requirement to be able to successfully participate in new technology developments in the near-frontend sub-100 nm range. The center offers customers the opportunity to develop and test new manufacturing processes, as the stringent workflows in high-volume fabs such as Infineon, Globalfoundries or Bosch offer little scope for such test phases.