Carl Zeiss SMT announces request for large mask repair system order
Carl Zeiss SMT has announced the receipt of further orders for its MeRiT mask repair systems from global leaders in the field of chip and photomask fabrication in the first quarter of 2007.
Frank Averdung, Managing Director of the Semiconductor Metrology Systems (SMS) division at Carl Zeiss SMT, points out: "The increasing miniaturisation of structures is leading to a paradigm shift in mask repair. The principal benefits of electron beam-based mask repair such as detail resolution, reliability and stability are becoming more and more critical for success. In addition, no foreign ions are introduced into the mask substrate."
"In the development of MeRiT, decades of ZEISS technology in electron optics and structuring technology in the nanometre range are combined in a single system. In this way, we were able to develop an innovative solution," emphasizes Averdung.
Averdung's comments are confirmed by a constantly growing and now major market share in the technologically advanced segment for mask repair systems since the market launch of the ZEISS technology in January 2004.
