UMC expanded support will assist Mentor Graphics’ in yield improvement
Mentor Graphics Corporation has announced that UMC has expanded its support for the Calibre nm Platform with Calibre YieldAnalyser for all major design flows for its 90 nanometre (nm) and 65nm processes. Mentor and UMC have worked collaboratively to introduce Design for Manufacturing (DFM) capabilities that give designers valuable information to guide physical design improvements that can increase production yields.
The DFM collaboration between Mentor Graphics and UMC started in 2005 with the creation of production decks to enable Mentor's Calibre YieldEnhancer for UMC's 180nm through 65nm processes.
"Our long-term relationship makes Mentor Graphics a natural choice as an ongoing EDA partner for CAA," said Patrick Lin, Chief SoC Architect, System and Architecture Support at UMC. "We have found that the Calibre YieldAnalyser tool produces results with excellent correlation to our internal data standard. This work complements our existing Calibre YieldEnhancer Via-doubling. We believe our support for Calibre's DFM tools provides a valuable advantage for our mutual customers."
"YieldAnalyser and YieldEnhancer are just two components of the expanding Calibre nm Platform first introduced a year ago with nmDRC," said Joe Sawicki, vice president and general manager of the Design-to-Silicon division at Mentor Graphics.