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Cymer demonstrates 25 Watts of average EUV power for 1 ½ hours

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The company also completes development of EUV manufacturing facility. Both will support the industry’s future goal and technology roadmap
Cymer, a supplier of light sources used in semiconductor lithography, announced this week at the Sematech EUV Source Workshop in New York that it has reached 25 watts of average extreme ultraviolet (EUV) power continuously for 1 1/2 hours duration, and is on track to achieve the100 watts of average power needed for the first scheduled delivery of production ready EUV lithography tools in 2009. Additionally, Cymer announced the completion of its EUV manufacturing facility located in San Diego, a reflection of the company’s leadership and dedication to its lithography tool and chipmaker customers, who will rely on EUV technology to advance the semiconductor industry. The first pilot EUV sources are currently being assembled and tested in this new facility.

Throughout its EUV system research and development, Cymer has demonstrated a consistent track record of source improvement. In November 2007, Cymer achieved 100 watts of EUV burst power, which confirmed the ability to reach high energy conversion efficiency (CE) from 10.6 micron drive laser to 13nm EUV output. With this high CE, Cymer then focused development on increasing the duty cycle of the source, and by doing so, demonstrated 35 watts of average EUV power for a few seconds in February. Cymer has now achieved a continuous run of its source for 1 ½ hours at an average power of 25 watts.

“Just three months after achieving 35 watts of EUV power for a short burst, Cymer has made significant progress in reaching 25 watts of average EUV power for more than one hour,” said Ed Brown, president and chief operating officer for Cymer. “This power and duration achievement paired with the completion of our EUV manufacturing facility reflects Cymer’s commitment to EUV and the commercialisation of future lithography tools.”

For more than a decade, scientists at Cymer have been developing the critical light source customers will need to launch EUV into production. Cymer has reached all of its EUV power performance milestones using a laser produced plasma (LPP) system consisting of a multi staged carbon dioxide laser and tin droplet target, which has been in operation since June 2006. In the first quarter of 2007, Cymer also disclosed a breakthrough in debris mitigation technology that will substantially extend the lifetime of the multi layer mirror collector, a key component of the source system, enabling an economically viable cost of operation. These rapid advancements in technology validate the LPP architecture's ability to scale to high volume manufacturing performance requirements.
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