+44 (0)24 7671 8970
More publications     •     Advertise with us     •     Contact us
*/
News Article

Imec & CMOS Partners Propose RMG Options For Further Transistor Scaling



Imec is testing and evaluating various options for further transistor scaling using high-k dielectrics and metal gates in a replacement metal gate (RMG) integration schemes.


Although RMG technology is inherently more complex than gate-first integration, it has a number of advantages that allow increasing the device performance and that widen the choices in terms of high-k and metal gate materials.


The R & D institute presented a number of noted papers on RMG at the 2012 VLSI Technology Symposium, which is taking place between June 12th and 15th, 2012, Honolulu, Hawaii, USA.


One of the current challenges to enable further device scaling is the choice of gate dielectric and gate electrode. For the selection of the gate electrode, the key parameters to consider are the work function, resistivity and compatibility with CMOS technology. Further scaling also requires continued improvement of the channel mobility, adding the options for improved stress management and also reliability control as a first-order consideration in the choice of materials and processes.


In the industry, the RMG approach is rapidly becoming the integration scheme of choice, and an alternative for the gate-first approach. In RMG, the high-k gate dielectric is deposited in the beginning of the flow or just prior to gate electrode deposition and the gate electrode is deposited after the formation of the junctions.


A clear advantage is the enhancement of the channel stress in shorter devices because of the dummy-gate removal, an intrinsic step in RMG flow. RMG also allows metal gate processes with a lower thermal-budget, which broadens the range of material options for work-function tuning and reliability control. Additional advantages are a lower gate resistance compared to gate-first, important for RF CMOS, and more room for mobility improvement.


With the eye on further scaling to sub-20nm technology nodes, imec is now evaluating RMG technology for different applications. Researchers are looking at different integration options, materials selection and engineering, and compatibility with advanced modules and device architectures, for which imec is collaborating with the major tool suppliers.


Regarding its partners, imec says it is conducting fair comparisons of options, and in-depth understanding of the physical mechanisms and techniques involved, and taking the chance to explore the limits in performance and reliability.


The research is performed in cooperation with imec's key partners in its core CMOS programs. These are GLOBALFOUNDRIES, Intel, Micron, Panasonic, Samsung, TSMC, Elpida, SK hynix, Fujitsu and Sony.

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: