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News Article

Entegris' 10nm Filter Can Jumpstart Next Technology Node



Entegris, Inc. of Taiwan will feature its 10 nm-rated Intercept HPM liquid filter, its latest generation of advanced filtration solutions at the SEMICON Taiwan tradeshow.

The show is being held at the Taipei World Trade Center, Taiwan, between September 5th and 7th, 2012 at booth #174.

Designed for very demanding advanced semiconductor manufacturing, this new version of the Intercept HPM family of filters is designed to remove particles and other contaminants from dilute liquid chemistries and solutions used in the wet etch and clean process at semiconductor fabs.

The new filter uses surface modified, asymmetric UPE (ultra-high molecular weight polyethylene) membrane which is hydrophilic to provide the highest level of cleanliness and particle retention while maintaining high process flows.

"As the semiconductor industry continues to develop more advanced chip designs using sub-20 nm process technologies, more advanced filtration is needed to achieve the desired defectivity levels," said Todd Edlund, vice president and general manager of the Entegris Contamination Solutions Division. "The 10 nm-rated Intercept HPM filter expands our broad offering of liquid filters, and complements our Torrento line of advanced high-flow filters used for aggressive chemistries."
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