News Article
Mattson Wins Order for Multiple Etch Systems From CMOS Manufacturer
Mattson Technology, a supplier of advanced semiconductor processing equipment, has received a follow-on order for multiple paradigmE etch systems from a major CMOS image sensor (CIS) manufacturer.
The systems will support a volume production ramp of CIS devices produced at this customer's fabrication facility.
"As consumer demand for higher-performance digital cameras, smartphones, and other mobile devices continue to grow, CIS manufacturers continue to push the performance of imaging sensors to new heights," says Rene George, vice president and general manager of the Plasma Products Group for Mattson Technology. "To achieve the high levels of image quality at competitive cost structures for volume production, these manufacturers require high-performance, reliable manufacturing equipment that maximises productivity."
"Our paradigmE was selected for its ability to deliver the leading-edge etch technology while providing the manufacturing flexibility and cost-of-ownership advantages that enable our customer to boost its production capacity to meet the brisk demand for image sensors in the growing consumer electronics markets. Winning these repeat orders validates our customer's confidence in our technology and demonstrates that we continue to expand and strengthen our etch position," continues George.
Mattson Technology, Inc. designs, manufactures and markets semiconductor wafer processing equipment used in the fabrication of integrated circuits. The firm is a supplier of plasma and rapid thermal processing equipment to the global semiconductor industry, and operates in three primary product sectors: Dry Strip, Rapid Thermal Processing and Etch.
