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Flow mode DLS shows promise for in-line slurry particle sizing CMP slurry

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Research engineers and scientists at Mega Fluid Systems are investigating Malvern Instruments flow mode DLS technology and developing new methods for CMP slurry.

Koh Murai, VP of Engineering, presented the initial results at the Levitronix 29th European CMP Users Meeting in Zurich, Switzerland. The main objective of the work is to determine feasibility of using flow mode DLS for in-line characterization of CMP slurry.

The presentation covers methods and apparatus, range of application flow rates, precision, and impact of heating due to extensive recirculation. Key conclusions are flow mode DLS which is promising for in-line slurry particle sizing, and extensive recirculation did not result in measurable changes in mean particle size.

"We are very happy to take an active role in embedding leading-edge technologies, such as Malvern Instruments, into advanced particle measurement techniques critical to the CMP industry," says Jack McCann, Mega Fluid System's President. "It is yet another indication that Mega is committed to furthering our leadership position as the world's superior resource for slurry blend and delivery equipment."

Mega continues to work on challenges of flow control and accuracy of flow mode DLS. The new method is expected to provide a platform for in-line, high precision characterization of particle size distribution over the range 5 to 500nm, a size range critical to CMP slurry performance for 450mm and beyond.

Founded in 1990, Mega Fluid Systems has extensive experience offering leading-edge chemical and slurry blend and delivery equipment to the global semiconductor, LED, pharmaceutical, specialty chemicals, and solar/PV industries.

 

 

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