Axcelis to ship multiple ion implanters to new Asian fab
The firm's high energy 'Purion XE' implanters will be used in the production of NAND devices. They deliver excellent purity, precision and productivity to meet today's and future process requirements
Axcelis Technologies, a supplier of enabling ion implantation solutions for the semiconductor industry, has received a multiple system order for its new Purion XE single wafer, high energy implanter.
The systems will be installed at the customer's new fab in the Asia Pacific Region, and will be used in high volume production of advanced NAND devices. The systems will ship in Q4.
Axcelis expects to receive additional follow-on orders as manufacturing capacity at the new fab expands.
John Aldeborgh, executive vice president, customer operations, says, "We are pleased to expand our installed base with this industry leader and look forward to collaborating closely with them as they ramp their manufacturing capacity. The Purion XE is the industry's most advanced high energy system available today, and provides customers with unique, compelling solutions to meet the demands of high volume, next generation device manufacturing."
The Purion XE is one of the industry's most advanced high energy implanters. The system leverages the Purion platform to deliver absolute beam purity and the most precise dopant placement possible, while ensuring the highest levels of productivity and capital efficiency.
The Axcelis single wafer LINAC technology provides high energy productivity and low cost of ownership, while providing customers remarkable manufacturing flexibility with true medium current capability. Each member of the Purion family shares a common, powerful 500+ wafers per hour end station, industry leading source technology and an innovative and precise ultra-pure beam line.