SÜSS MicroTec delivers 25th Mask TrackPro
SÜSS MicroTec delivered its 25th Mask TrackPro System, its newest generation tool to a major Asian IDM at the end of 2013.
This sytem is devised for cleaning frontend photomasks in the semiconductor industry.
The customer started the installation of this tool in December 2013 and will use it for cleaning and maintenance of optical masks for 193i lithography in its new factory in China.
SÜSS MicroTec is a provider for photomask cleaning equipment for the conventional 193i lithography and newly developed EUV lithography.
"In the semiconductor industry, the photomask is an important part of the frontend-infrastructure. At any given time the mask must be 100 percent perfect, otherwise any defect on the mask would replicate on every processed wafer," says Frank P. Averdung, President and CEO of SÜSS MicroTec.
"We have set the standards with our know-how and our photomask cleaning tools in 193nm immersion-lithography and the upcoming EUV lithography."
