JSR and imec Formalize Joint Venture for EUV Lithography Resist Solutions
Materials company JSR Corporation and imec, nanoelectronics R&D centre, have announced the signing of a Joint Venture Agreement which formalized the Letter of Intent (LOI) signed on May 12, 2015 between JSR's wholly-owned subsidiary in Belgium, JSR Micro NV, and imec, enabling manufacturing and quality control of EUV lithography materials for the semiconductor industry. The new company, EUV Resist Manufacturing & Qualification Center NV (EUV RMQC), is incorporated with a majority of the total shares held by JSR Micro NV.
As EUV technology advances, the IC industry is putting pressure on materials suppliers and other vendors to prepare the manufacturing infrastructure and quality control capabilities required for taking EUV into high volume manufacturing.
"We understand the importance of EUV lithography for the future of advanced semiconductor manufacturing technologies," said Bart Denturck, President of EUV RMQC and Director and Plant Manager of JSR Micro NV.
"To meet those industry needs and requirements, two world-leading organizations are bringing their expertise into this joint work. EUV RMQC will provide two crucial roles for EUV lithography "“ superior, high-quality manufacturing capability and expertise and services for quality control with advanced tools. We believe this partnership will deliver great EUV lithography solutions to the industry."
"EUV lithography is critical to the advanced nodes of the future, and imec is focused on supporting the entire supply chain to prepare a EUV infrastructure for high volume manufacturing. Our world-class cleanroom makes use of the most advanced EUV tools worldwide, making us the perfect partner for research and collaboration," stated An Steegen, Senior Vice President at imec. "This joint venture with JSR underscores imec's dedication to support material suppliers, giving them access to the most advanced process flow and state-of-the-art equipment. It is an excellent example of how joining forces and leveraging strengths can help the semiconductor industry to realize a shared goal."
EUV lithography is considered as one of the main drivers to extend Moore's law toward single digit nanometer technology nodes. imec and JSR's collaboration will allow both companies to leverage their strengths when delivering photoresist solutions for the semiconductor industry to manufacture the most advanced devices.
