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NEWSLETTER SPONSOR: Pfeiffer Vacuum
Pumps for CVD and Diffusion The Pfeiffer Vacuum A3004XN dual stage Roots pumps are fully resistant against corrosion for diffusion and CVD applications. It is high flow compatible at up to 100 SLM and a low base pressure of 3.10-3 Torr. The pump has a reduced footprint, low power consumption and reduced maintenance costs for the lowest COO in its class.
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