The production proven ULVAC Enviro Optima resist strip system replaces up to 6 legacy ashing tools. It provides the highest throughput per square meter of clean-room space at the lowest CoO. At >12µm/min ashing rate and 245 WPH, Optima utilizes the latest ashing technology featuring a remote ICP plasma source for ultra-high throughput. The system is configurable for 100mm – 300mm wafers.
Volume 2024 - Issue 04/05
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