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From Lens To Wafer Polishing

Nikon has obtained a "significant" order for its NPS3301 300mm chemical mechanical planarisation (CMP) system that will be shipped to a leading development facility in Japan. The system will be focused on advanced 65nm copper/low-k interconnect polishing. Shipment is due this month, July 2003.
Nikon has obtained a "significant" order for its NPS3301 300mm chemical mechanical planarisation (CMP) system that will be shipped to a leading development facility in Japan. The system will be focused on advanced 65nm copper/low-k interconnect polishing. Shipment is due this month, July 2003.


Nikon develop the CMP system on the basis of decades of lens polishing experience. The company claims performance advantages through polishing optical materials "face-up" with a unique polishing pad configuration. This technique, coupled with Nikon's high speed rotation and low pressure range extending through 0.05psi, delivers polish capability uniquely suited to address the fragile material properties of next generation copper/low k interconnect materials.


The company also claims cost saving over traditional CMP systems that use a consumable ring surrounding each wafer during the polish process adding more than $20 to a wafer's production cost. Nikon effectively eliminates this ring resulting in millions of dollars of direct cost savings per year. Overall cost for consumable material used during wafer processing is up to 50% lower than competitive systems depending upon baseline process.



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