News Article
IBM To Use CVD Low-k At 90nm
IBM plans to use chemical vapour deposition (CVD) low-k technology at the 90nm node. This is a blow to Dow Chemical, the producer of the spin-on SiLK dielectric. Dow and IBM have worked together for some time.
IBM plans to use chemical vapour deposition (CVD) low-k technology at the 90nm node. This is a blow to Dow Chemical, the producer of the spin-on SiLK dielectric. Dow and IBM have worked together for some time.
Use of SiLK at IBM was one of Dow's most effective arguments for a spin-on low-k solution. It now appears that IBM will be using Novellus Systems' Coral material deposited by CVD.
Dow says that this move effectively delays the first potential high-volume use of its SiLK semiconductor dielectric resin at IBM until the 65nm node. Dow reports that IBM has confirmed the production viability of SiLK, and has built and shipped customer parts using it, but for business reasons chose to pursue CVD technology for the 90nm node.
Dow also says that it remains committed to the family of SiLK resins and maintains ongoing commercial and development relationships with leading industry players.

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