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Tuesday 12th September 2017
KLA-Tencor patterning control systems for sub-7nm IC manufacturing
Tuesday 12th September 2017
EV Group receives multiple lithography and metrology system orders
Tuesday 12th September 2017
QuickLogic offer eFPGA technology on SMIC 40nm low leakage process
Tuesday 12th September 2017
Cadence collaborates with TSMC on 7nm FinFET Plus design innovation
Tuesday 12th September 2017
ETEL'S new actuator to better meet semiconductor needs
Tuesday 12th September 2017
Rudolph achieves customer success with Firefly inspection system
Monday 11th September 2017
Samsung adds 11 nm FinFET process to its advanced foundry process portfolio
Monday 11th September 2017
Xilinx, Arm, Cadence, and TSMC announce CCIX silicon demonstration vehicle
Monday 11th September 2017
Flexible hybrid electronics – a new paradigm for semiconductors
Friday 8th September 2017
The vertical nanowire FET: enabler of highly dense SRAMs
Thursday 7th September 2017
Entegris and Hubei Jingxing sign manufacturing agreement
Thursday 7th September 2017
XMOS powers growth with $15 million funding round
Wednesday 6th September 2017
Newly optimized entry-level deposition system from Kurt J. Lesker
Wednesday 6th September 2017
SilTerra unveils 180nm ultra low leakage technology
Wednesday 6th September 2017
Siborg Systems develops new tools for optical sensor development
Wednesday 6th September 2017
Lam Buys software firm Coventor
Wednesday 6th September 2017
STC Standard Technology Taiwan & AP&S become partners
Tuesday 5th September 2017
Dow, DuPont complete merger to form DowDuPont
Monday 4th September 2017
SPTS Technologies wins OHS award
Thursday 31st August 2017
Qualcomm and Himax Technologies announce 3D depth sensing solution
Thursday 31st August 2017
Silicon solves problems for next-generation battery technology
Thursday 31st August 2017
Scientists move graphene closer to transistor applications
Thursday 31st August 2017
Panel makers forecast to maintain high fab utilization rates in Q3
Thursday 31st August 2017
NanoString and Lam collaborate
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