News Article
SupraYield Lithography
SUSS MicroTec announced new capabilities for cost-effective 1X full-field lithography (1XFFL) with a package of four new technologies. Known collectively as SupraYield, the enhancements provide a high-performance 1XFFL solution for advanced thick-resist applications, such as wafer-level packaging, MEMS and optoelectronics.
SUSS MicroTec announced new capabilities for cost-effective 1X full-field lithography (1XFFL) with a package of four new technologies. Known collectively as SupraYield, the enhancements provide a high-performance 1XFFL solution for advanced thick-resist applications, such as wafer-level packaging, MEMS and optoelectronics.
SUSS claims that 1XFFL systems enhanced with SupraYield Technology can double throughput, achieve 1micron resolution and submicron overlay and reduce lithography costs by up to 66% compared with steppers.
"SUSS 1XFFL systems efficiently expose the entire wafer, up to 300mm, in one step, allowing twice the throughput at about half of the purchase price of comparable 1X stepper technology," said Dr Franz Richter, president and CEO of SUSS MicroTec.
SupraYield is a package of four technologies: Mask Pellicle Technology (MPT), ThermAlign Chuck, advanced photoresists and Large Clearfield Mask Movement.

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