News Article
Exploration of the deep sub wavelength era
SPIE Photomask will explore issues of the deep sub wavelength era at a photomask technology symposium.
The deep sub wavelength era has arrived, and world leaders in the photomask industry will meet in Monterey, CA, next month to explore its challenges and opportunities. The SPIE Photomask Technology symposium, sponsored annually by SPIE and BACUS, will provide a forum for reports on the latest research and emerging and ongoing issues in advanced lithography, as well as manufacturing and data solutions. The event will be held 6-10 October at the Monterey Marriott and Monterey Conference Centre. BACUS is SPIE's international technical group for photomask technology.
In addition to technical presentations and a professional development programme, the event includes an exhibition featuring the industry's top manufacturers and designers. The exhibition is open to registrants for no additional fee.
Aart J. de Geus, Chairman and CEO of Synopsys, will open the technical programme with a keynote talk. Since co-founding Synopsys in 1986, de Geus has expanded the company from a start up synthesis enterprise to a world leader in software and IP for semiconductor design and manufacturing.
A special session presenting an overview of the key issues facing the industry will focus on mask infrastructure challenges at the 32 nm node and beyond for the mask industry and its suppliers. This session will address a wide range of technical issues, development barriers, and potential roadblocks facing the mask industry. Talks will be given by mask makers, device manufacturers, and researchers engaged in state of the art technology development and R&D.
Conference chairs are Hiroichi Kawahira of Sony Corp. and Larry S. Zurbrick of Agilent Technologies. Conference proceedings papers will be published online in the SPIE Digital Library beginning immediately as approved after the meeting.
In addition to technical presentations and a professional development programme, the event includes an exhibition featuring the industry's top manufacturers and designers. The exhibition is open to registrants for no additional fee.
Aart J. de Geus, Chairman and CEO of Synopsys, will open the technical programme with a keynote talk. Since co-founding Synopsys in 1986, de Geus has expanded the company from a start up synthesis enterprise to a world leader in software and IP for semiconductor design and manufacturing.
A special session presenting an overview of the key issues facing the industry will focus on mask infrastructure challenges at the 32 nm node and beyond for the mask industry and its suppliers. This session will address a wide range of technical issues, development barriers, and potential roadblocks facing the mask industry. Talks will be given by mask makers, device manufacturers, and researchers engaged in state of the art technology development and R&D.
Conference chairs are Hiroichi Kawahira of Sony Corp. and Larry S. Zurbrick of Agilent Technologies. Conference proceedings papers will be published online in the SPIE Digital Library beginning immediately as approved after the meeting.
