News Article
Next generation for Mattson Technology
The company receives next generation order for Suprema photoresist system from leading global semiconductor manufacturer.
Mattson Technology, a supplier of advanced process equipment used to manufacture semiconductors, announced that it has received a next generation development tool order for the company's Suprema photoresist strip system from a leading global semiconductor manufacturer for high-k and metal gate strip application development for 32 nanometre (nm) node. The Company noted that the system has already shipped; and this order marks the first Suprema system being shipped to the customer for development of its logic devices, which are expected to be in pilot production during the latter half of 2009.
Sr. Vice President and General Manager of Mattson Technology's surface cleaning group, Neal Holmlund, said, "We are pleased to have been selected by our long standing customer to support their development of advanced technology node. This customer was one of the early adopters of Suprema for volume production, and this selection represents the customer's confidence in Mattson's ability to provide advanced strip applications for 32nm development."
Holmlund added, "Advanced logic devices require new materials such as high-k film to enhance the transistor performance; and process tools must be flexible and robust enough to handle these materials and deliver 'on-wafer' results without any compromise. Mattson was able to meet our customer's stringent process requirements in a short period of development time. In choosing the Suprema system, the customer cited the extremely high reliability and throughput of the product, coupled with enabling process performance, maturity and extendibility to future technology nodes." Holmlund concluded, "We believe that the Suprema can be a strong contributor to the success of our customer in their development of advanced node design rules. This selection for the Suprema is evidence that our long range strategy of enabling superior 'on-wafer' performance successfully delivers the right product for the future of our customers."
Sr. Vice President and General Manager of Mattson Technology's surface cleaning group, Neal Holmlund, said, "We are pleased to have been selected by our long standing customer to support their development of advanced technology node. This customer was one of the early adopters of Suprema for volume production, and this selection represents the customer's confidence in Mattson's ability to provide advanced strip applications for 32nm development."
Holmlund added, "Advanced logic devices require new materials such as high-k film to enhance the transistor performance; and process tools must be flexible and robust enough to handle these materials and deliver 'on-wafer' results without any compromise. Mattson was able to meet our customer's stringent process requirements in a short period of development time. In choosing the Suprema system, the customer cited the extremely high reliability and throughput of the product, coupled with enabling process performance, maturity and extendibility to future technology nodes." Holmlund concluded, "We believe that the Suprema can be a strong contributor to the success of our customer in their development of advanced node design rules. This selection for the Suprema is evidence that our long range strategy of enabling superior 'on-wafer' performance successfully delivers the right product for the future of our customers."
