News Article
TEL and Edwards jointly develop abatement solution
The new system will help to reduce PFC pollution from dielectric film etching processes used in semiconductor manufacturing.
Edwards announced that it will jointly develop a perfluorocarbon (PFC) gas abatement system with Tokyo Electron (TEL), the PA-01E for etch equipment. The new gas abatement system will be available mid year 2009.
“We are excited to enter into this joint development agreement with TEL,” said Nigel Hunton, Edwards’ CEO. “The contribution of PFC gases to global warming has been extensively documented, and we look forward to working with TEL’s engineering staff to provide an effective, low cost of ownership gas abatement system specifically designed to reduce the dangers of PFC pollution as a result of the semiconductor etch process.”
The PA-01E system will help to reduce PFC pollution resulting from the dielectric film etching processes used in semiconductor manufacturing. It will be equipped with a plasma abatement device, collectively developed with Adtec Plasma Technology Co., Ltd., Hiroshima, Japan, which offers a high transformation rate and stable operation. It is also designed to have a significantly lower cost of ownership due to its reduced requirement for energy, consumables and maintenance. In addition, the PA-01E system will be designed to abate carbon monoxide in addition to PFCs, eliminating the need for additional abatement hardware.
“We are excited to enter into this joint development agreement with TEL,” said Nigel Hunton, Edwards’ CEO. “The contribution of PFC gases to global warming has been extensively documented, and we look forward to working with TEL’s engineering staff to provide an effective, low cost of ownership gas abatement system specifically designed to reduce the dangers of PFC pollution as a result of the semiconductor etch process.”
The PA-01E system will help to reduce PFC pollution resulting from the dielectric film etching processes used in semiconductor manufacturing. It will be equipped with a plasma abatement device, collectively developed with Adtec Plasma Technology Co., Ltd., Hiroshima, Japan, which offers a high transformation rate and stable operation. It is also designed to have a significantly lower cost of ownership due to its reduced requirement for energy, consumables and maintenance. In addition, the PA-01E system will be designed to abate carbon monoxide in addition to PFCs, eliminating the need for additional abatement hardware.
