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Vistec Lithography completes move to New York

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The company completes relocation from United Kingdom to become first international high tech equipment supplier to move entire operation to New York’s Capital Region.
The nanotechnology company opens global headquarters and manufacturing facility at Watervliet Arsenal to complement a R&D centre at UAlbany NanoCollege. New York State Assembly Majority Leader Ron Canestrari, United States Senator Charles E. Schumer, and Congressman Mike McNulty were joined by officials from Vistec Lithography (Vistec), the Arsenal Business & Technology Partnership (Partnership), the College of Nanoscale Science & Engineering (CNSE) of the University at Albany, and the Watervliet Arsenal to officially open Vistec’s new global headquarters and state of the art manufacturing facility in Watervliet. Combined with its research and development centre located at the UAlbany NanoCollege, Vistec becomes the first high tech equipment supplier to move its entire operation to New York’s Capital Region.

In October 2006, Assembly Speaker Sheldon Silver and Assemblyman Ron Canestrari announced the Assembly was providing $30 million in funds it secured in the state budget toward the relocation of Vistec’s global headquarters, research and development, manufacturing and business operations from Cambridge in the United Kingdom to the Arsenal Campus in Watervliet and CNSE’s Albany NanoTech Complex. As part of the move, Vistec is expected to invest $125 million at the Arsenal Campus and UAlbany NanoCollege, with more than 130 high technology jobs projected to be created over five years involving Vistec and its supplier network.

Vistec is leasing approximately 30,000 square feet of space in the Arsenal’s Building 125, where it has transformed a former Arsenal machine shop into a high tech facility with cleanrooms, production space, and modern offices. Vistec, the Partnership and CNSE worked jointly with M+W Zander, a renowned global architecture, engineering and construction management firm with offices at the Arsenal, to renovate the space into facilities in support of Vistec’s next generation electron beam lithography technology.

Assembly Majority Leader Canestrari, said, “This is a great day for the Capital Region economy. Vistec’s success here makes it clear that this region has the capability to attract and support companies that use the latest and most sophisticated technologies. Vistec’s new headquarters and manufacturing facilities are breathing new life into a large building that was previously underutilised at the Watervliet Arsenal. The collaboration between the Arsenal Partnership and the UAlbany NanoCollege, with support from other institutions in the region, is a roadmap for future economic growth and attracting and retaining a highly educated workforce.”

United States Senator Schumer, said, “Today is the culmination of a lot of hard work at the local, state and federal levels. If an old, dirty, industrial hulk like Building 125 can be redeveloped into clean room space for high tech manufacturing than I know the Watervliet Arsenal and the Capital Region are on track for a bright future.”

Congressman Mike McNulty, said, “The relocation of Vistec Lithography from the United Kingdom to Watervliet is proof that what I have been saying for years is true, that cutting edge private sector companies could prosper at the Arsenal while enhancing the critical mission of the U.S. Army. The future of the Arsenal is bright so long as we continue to build on successes like these, where high tech companies bring new jobs and new life to this historic facility. This would not have been possible without the collaboration of many partners, including my colleagues Senators Schumer and Clinton, and especially the New York State Assembly and Assembly Majority Leader Ron Canestrari who took an active role in making this deal a reality.”

Papken Der Torossian, Chairman of Vistec, said, “Vistec Lithography, is very pleased to now have our global headquarters located at the Watervliet Arsenal. We benefit greatly from the synergies between the UAlbany NanoCollege and its numerous global partners, including academic and research institutions, equipment and supplier companies, and key nanoelectronics manufacturers in the region”.

Dr. Alain E. Kaloyeros, Senior Vice President and Chief Executive Officer of CNSE, said, “The opening of Vistec Lithography’s global headquarters and leading edge manufacturing facility at the Watervliet Arsenal, complementing its world class research and development centre at the UAlbany NanoCollege, is a glowing testimony to the extraordinary vision, pioneering leadership and exceptional investment of Speaker Sheldon Silver, Majority Leader Ron Canestrari and the New York State Assembly. As one of the world’s leading nanotechnology companies, and the first high tech equipment supplier to move its entire operation to New York’s Capital Region, Vistec is among the growing number of international companies to recognise that when it comes to cutting edge nanoscale research, development and manufacturing, all roads lead to New York State.”

Tony Gaetano, President of the Arsenal Business and Technology Partnership, said, “Vistec brings the 21st century to the Arsenal, in products, jobs, suppliers, and networks. They’re another window to the future for the entire region. And, they’ll attract more companies like them to the site. This is a great day for Watervliet,”

Colonel Scott N. Fletcher, Commander, U.S. Army Watervliet Arsenal, said, “"The Vistec grand opening means more to the Arsenal than just another ceremony. Today's event symbolises continued hope for a long term, viable future of the U.S. Army at the Watervliet Arsenal."

Vistec Lithography, together with Vistec Electron Beam in Germany (both formerly operating under Leica Microsystems), are noted for the production and development of advanced electron beam lithography equipment on 200mm and 300mm platforms for applications at the nanoscale level. As providers of electron beam lithography systems critical to the future of nanotechnology, Vistec Electron Beam Lithography Group is targeting emerging business applications in nanotechnology, biomolecular, bioelectronics, next generation lithography mask making, silicon direct write (defence/aerospace), telecommunications, micro optics and micromechanics markets, as well as industrial applications in electron beam direct write and commercial mask writing.

The joint Vistec-CNSE Centre for NanoScale Lithography, located at CNSE’s Albany NanoTech, allows Vistec to conduct its most advanced research and development for electron beam lithography equipment in the interdisciplinary fields of nanotechnology in partnership with the faculty and students at the NanoCollege. This centre also provides a critical education and workforce training capability for the newly created high technology jobs located at the Arsenal.
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