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News Article

Litho stimulus from SPIE

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SPIE Advanced Lithography, the annual forum of the lithography community, will bring worldwide experts working in EUV, smart metrology, resist materials, processing technology, and other established and emerging topics to the 34th event next February in San Jose.
“For the past 33 years, SPIE Advanced Lithography has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry,” said Christopher J. Progler of Photronics Inc., the 2009 symposium chair. “If you can attend only one conference this year, SPIE Advanced Lithography is the obvious choice, as it brings the whole community to one place to solve today’s problems and plan for the future.”

In addition to the technical program, an exhibition featuring approximately 100 companies will run Tuesday and Wednesday during the week. Companies will show the latest technologies for applications and systems and their solutions to the lithography challenges.

A suite of 21 professional development courses and workshops will be offered on topics ranging from lithography and semiconductor fundamentals to emerging techniques and approaches, at introductory, intermediate, and advanced levels.

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