NIL progress
HamaTech APE hasannounced that the MaskTrack Pro TeraPure system has been selected for Nano-Imprint Lithography (NIL) cleaning requirements at DNP, a producer of semiconductor photomasks. Significant developments in cleaning technology and system design distinguish the MaskTrack Pro as the clear choice for Next Generation Lithography, 193i 22nm half pitch (hp) double-patterning (DPT), Extreme Ultraviolet Lithography (EUVL) and NIL.
“Pristine, defect-free master imprint masks are critical for low-cost NIL mask replication” said Mr. Naoya Hayashi, research fellow at DNP “HamaTech is the one company in the industry today that has demonstrated the best cleaning technology for advanced master imprint mask and replica integrity requirements of tomorrow. Our selection of the MaskTrack Pro TeraPure and collaborative research efforts with HamaTech and other industry partners provides us with access to innovative technology to meet the semiconductor industry’s emergent lithography demands for a production-ready NIL infrastructure at the 22nm hp node.”
“At HamaTech, we believe that it is essential to align with leaders in Next Generation Lithography and are honored by DNP’s choice of the MaskTrack Pro TeraPure for its critical cleaning technology research on NIL processes” said Wilma Koolen-Hermkens, CEO of HamaTech APE “TeraPure is the first system in the industry that can address NIL zero tolerance levels for particles and defects on the master mask and replica, securing pattern integrity and surface conditions for a cost-effective imprint. DNP is our partner of choice to jointly develop the necessary processes of record (PORs) for the successful introduction of NIL.”
The TeraPure Platform is scheduled for installation at the DNP facility in January 2010.
