Chartered chooses Brion
Brion Technologies, an ASML company, has reached a multi-year agreement with Chartered Semiconductor Manufacturing to implement a broad suite of computational lithography products. Chartered will use Tachyon OPC+ (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products to design and manufacture 45-nanometer (nm) and below technology node devices.
Brion’s products will help Chartered optimize its ASML scanners to provide a comprehensive lithography solution with optimal cost of ownership. Brion will work with Chartered to implement Tachyon computational products to deliver larger manufacturing process windows resulting in improved line width control for higher yield.
Meeting the imaging requirements of advanced technology nodes will require the effective use of increasingly complex Resolution Enhancement Techniques (RET). Chartered will have access to Brion’s double-patterning solutions and computational lithography solutions. Brion’s double patterning options allow Chartered to select the optimum combination of techniques for each design and every layer, which help to minimize lithography costs.
“Chartered is committed to providing its customers with robust and cost-effective manufacturing solutions. ASML’s and Brion’s integrated suite of lithography products for process development, mask design and litho manufacturing enables Chartered to offer advanced technology solutions that are optimized for higher yields,” said Liang Choo Hsia, senior vice president of technology development at Chartered.
“Brion is excited to work with Chartered and help it address the increasing challenges of advanced semiconductor manufacturing,” said Jim Koonmen, general manager of Brion. “We offer the broadest and most powerful range of computational lithography products and look forward to a long and mutually beneficial relationship with Chartered.”
