TSMC and MAPPER reached joint development milestone
TSMC and MAPPER Lithography today revealed that a pre-alpha MAPPER tool located on TSMC's Fab 12 GigaFab is repeatedly printing features previously unachievable using current immersion lithography technology. Over the past several months TSMC has expanded its Maskless Lithography team and has been working with MAPPER engineers at Fab 12 to integrate electron beam direct write capabilities into manufacturing processes for development of future technology nodes.
"TSMC is always searching for the most cost effective manufacturing processes," says Dr. Shang-Yi Chiang, TSMC Senior Vice President of Research & Development. "The results coming from our project with MAPPER have met aggressive objectives and mark a significant achievement in our Multiple-E-Beam Direct Write program that covers all viable Multiple-E-Beam technologies. Based on these encouraging results, we are convinced that the Multiple-E-Beam technology is one of the technologies to become the future lithography standard."
Dr. Christopher Hegarty, MAPPER's CEO adds, "Having TSMC as our launch customer is of great benefit to MAPPER. Now that we have an operational tool at TSMC and we simultaneously intensify our efforts in bringing MAPPER's technology to market, we are supremely confident that electron beam direct write will be successfully introduced into high-volume manufacturing processes."
