News Article
Metrology for e-beam mask writing
Carl Zeiss System receives final acceptance for metrology system for e-beam photomasks
The Carl Zeiss registration and overlay metrology system for photomasks, PROVE, successfully passed the Final Acceptance of NuFlare Technology, a supplier of e-beam based mask writers for lithography masks. PROVE enables NuFlare to calibrate and qualify their e-beam mask writers at a technologically advanced level.
The calibration via a registration system is a critical step in the manufacturing of e-beam writers and essential for their performance.
“The Carl Zeiss system is state-of-the-art and has the resolution capabilities we require. The high accuracy and unprecedented measurement possibilities of PROVE are crucial for development and optimization of our latest generation e-beam mask writers. Having this new system in operation we will be able to extend our lead towards the competitors” states Mr. Fumiaki Shigemitsu, Director of NuFlare Technology.
PROVE is designed to measure image placement and critical dimension on photomasks with sub-nanometer repeatability and accuracy. Through its superior 193nm optics the system offers higher resolution that will enable the EUV mask roadmap. It was collaboratively developed within three years by the Semiconductor Metrology Systems Division in Jena/Germany, and the Lithography Optics Division in Oberkochen/Germany, it is manufactured in Jena.
