News Article
SUSS MicroTec launches New Resist Coat and Develop Platform
SUSS MicroTec, a supplier of equipment and process solutions for the semiconductor and related markets, has launched the RCD8, a new manual Resist Coat and Develop Platform which covers all necessary coating and developing processes for applications in MEMS, advanced packaging, LED or the R&D market.
The tool offers the option to convert from a spin coater with the patented GYRSET closed cover coating technology to a spray developer within a few minutes. This coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a semi-automated GYRSET enhanced coater and puddle & spray developer tool, serving for daily R&D work up to small scale production.
As an additional option the GYRSET rotating closed cover coating technology can be integrated into the RCD8 spin coating module. GYRSET allows square substrates and pieces to be coated with a homogenous resist thickness.
