News Article
LFoundry announces 110nm Flash technology
LFoundry, a semiconductor specialist based in France, has just released its PDK 110 (Process Design Kit) paving the way for the production of semiconductors in 110nm Aluminum process, and integrating state of the art embedded Flash technology.
After two years of development and over EUR 5 million of R&D investments, LFoundry has released a design library including the appropriate set of tools for semiconductor design in 110nm node. This way, customer designs using LFoundry PDK 110 are based on LF 110 Flash elementary structures, ensuring they will fit perfectly with LFoundry manufacturing process.
"With the release of our PDK 110 Flash, our customers can design innovative and competitive solutions which will be produced in volume in our Rousset facility. This PDK is particularly well adapted for key applications such as digital security and CMOS imagery," commented Jean-Pierre Delesse, President, LFoundry Rousset.
The PDK 110 includes a 90nm embedded Flash cell, which LFoundry Rousset says makes them one of the most advanced semiconductor manufacturer on the European market. The state-of-the-art LF110 technology, allows for the building of smaller cells, which means better performance and density of semiconductor. Built on aluminum substrate connections, the LF110 technology brings the optimized combination between electrical performance and manufacturing cost.