Mattson supplies etch system to major fab
The silicon etch system, ParadigmE Si, aims to improve etch process control, boosting chip production
Mattson Technology, US supplier of semiconductor processing equipment, has confirmed it has installed its paradigmE etch system at a major semiconductor foundry.
The system is now in production in foundry/logic, memory and CMOS image sensor customer fabs across a range of regions, including China, Korea and Taiwan.
"This purchase of the paradigmE reinforces... our ability to deliver the etch processing performance and cost-of-ownership advantages that help maximise production results in the demanding foundry environment," says Rene George, vice president and general manager of Plasma Products Group.
The paradigmE Si silicon etch system enables users to run the chemistries required for poly-silicon application. If features proprietary technology, "Faraday shield", designed to improve etch process control and triple mean-time-between-clean performance compared to competitive systems.
According to the company, it also enables true independent control of ion density and energy, providing improved profile control and minimised sputtering to reduce maintenance costs; resulting in more than 30% better cost-of-ownership advantages versus other etch systems.
Mattson provides plasma and rapid thermal processing equipment to the global semiconductor industry, and operates in three primary product sectors: dry strip, rapid thermal processing and etch.
