Molecular Imprints Receives Multiple Order For Advanced Lithography
Molecular Imprints, Inc. (MII), has received a purchase order for multiple imprint modules that will be integrated into a semiconductor equipment company's stepper systems.
These modules include the latest MII proprietary Jet and Flash Imprint Lithography (J-FIL) technology which delivers the performance required for high volume manufacturing of advanced semiconductor memory devices.
"This multiple module purchase represents a vote of confidence from our customers that J-FIL is in the final stages of manufacturing readiness," says Mark Melliar-Smith, President and CEO of Molecular Imprints.
"Our equipment and commercial mask partners and internal teams have successfully coordinated their development activities and made tremendous progress over the last year, particularly in areas of defectivity and overall Cost of Ownership (CoO). We look forward to the next phase of commercialising our J-FIL technology and to enable the semiconductor memory device roadmap for years to come."
The company's J-FIL technology has demonstrated 24nm patterning with exceptional line edge roughness (less than 2nm LER, 3 sigma) and critical dimension uniformity (1.2nm CDU, 3 sigma) with extensibility to 10nm using a simple single patterning step process.
J-FIL's inherent CoO advantages achieved by avoiding power limited EUV light sources, complex optical lenses and mirrors, and difficulties with imaging using ultrasensitive photoresists, make it well aligned with semiconductor memory manufacturing.
