n&k Technology Bags Order For Scatterometer For EUV Photomasks
n&k Technology Incorporated has an order from a major semiconductor company in the U.S. for its n&k Gemini for measurements of EUV photomasks.
The n&k Gemini is a high resolution scatterometer specifically designed for accurate and repeatable OCD measurements of depths, CDs and profiles of complex 2-D and 3-D structures, as well as thicknesses, and n and k spectra of multi-layer films pertaining to photomasks.
The n&k Gemini simultaneously measures polarised reflectance and transmittance over the entire DUV-Vis-NIR wavelength regime (from 190nm to 1000nm). The spot size for both reflectance and transmittance is 50µm and analysis of these two quantities is based on Rigorous Coupled Wave Analysis (RCWA) for OCD combined with the Forouhi-Bloomer (F-B) Dispersion Equations for n and
"The n&k Gemini's unique optical design, which incorporates transmittance and reflectance, combined with the physically valid RCWA and F-B models, is a key element to successful measurements of EUV photomasks," says Rahim Forouhi, President and CEO of n&k Technology. "We are very pleased that this leading edge semiconductor manufacturer has chosen the n&k Gemini as a key component of its overall EUV endeavours," Forouhi further comments.
n&k Technology, Inc., based in Santa Clara, California, is a provider of advanced optical metrology tools for the semiconductor, MEMS, photomask, flat panel display, and data storage industries. The company's optical metrology equipment is used for measurements of film thicknesses, n and k spectra, phase shift, depths, CDs, and profiles of 2-D and 3-D structures.
