Oxford upgrades plasma and ion beam etch tools
Real-time chamber clean and endpoint detection increases the availability of the tools and lowers the cost of ownership
Oxford Instruments Plasma Technology has recently launched a new range of system upgrade options for its etch and deposition tools.
The new range of upgrades includes the X20 Control System, which offers excellent scan speeds and processing resulting in accurate control and precise data logging.
The robust Maglev Turbo replaces the current traditional bearing turbo pumps for superior pumping speeds and delivers up to 15 percent higher throughput.
What's more, etch and deposition end point detection options for achieving optimal process conditions and results have been enhanced. The optical end points enable real-time chamber clean endpoint detection and increases the availability of the tool, and lowers the cost of ownership.
Mark Vosloo, Sales, CS and Marketing Director for Oxford Instruments Plasma Technology comments, "We are committed to providing excellent customer service both pre- and post-sales. This new range of upgrades aims to offer our customers the latest hardware so that they have the opportunity for improved performance and extended lifetime of their Oxford Instruments system."
These upgrades add to the wide range of options already offered for the Plasmalab, PlasmaPro and Ionfab families of systems.
