+44 (0)24 7671 8970
More publications     •     Advertise with us     •     Contact us
*/
News Article

Joint Nikon & A*STAR lab to advance lithography processes

News


Nikon and A*STAR Institute of Microelectronics (IME) are uniting to set up an R&D lab to develop advanced optical lithography technology used in the manufacturing of semiconductor chips.

The companies will collaborate on technologies such as multiple patterning and direct self assembly techniques to drive the extension of ArF Deep Ultraviolet (DUV) dry and immersion lithography down to 20 nm and beyond.

The main aims are to target applications such as logic, high density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems (NEMS).

For Nikon, this is a strategic addition to new capabilities in Singapore.

This collaboration will allow Nikon to tap into IME's R&D infrastructure, process technology and talent pool to get early insights into its next-generation systems, which will shorten time-to-market.

It will open opportunities to Nikon to learn technology for future processes, and continue to push ArF immersion lithography for several device nodes.

The new capabilities will enhance and expand IME's joint collaborations with industry partners, research institutes and universities to develop advanced technologies such as metrology and materials for further technology shrinkage.

"Through this collaboration with IME, Nikon will gain knowledge of future process technology and total solutions, which will be important for our lithography system development. We are very excited to partner with one of the most advanced and established institute in the Asia region," says Kazuo Ushida, President of Nikon Precision Equipment Company.

"The Joint Lab synergises IME and Nikon capabilities to drive R&D leading to future technology nodes. Nikon is an ideal technology partner well established in technical excellence to help IME enhance and expand our R&D capabilities to meet the needs of the industry", adds Dim-Lee Kwong, Executive Director, IME. "The Joint Lab is a significant milestone for advanced semiconductor R&D in Singapore."

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: