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News Article

Philips Innovation qualifies Veeco PVD system for thin films

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Philips Innovation Services has recently qualified Veeco Instruments' NEXUS Physical Vapour Deposition (PVD) System at its location on the High Tech Campus Eindhoven, Netherlands.

This system will support Philips Innovation Services' capabilities in a broad range of thin film device applications, including MEMS, sensors, nano-electronics and others.

Christ van Hout, Strategic Purchasing CAPEX at Philips Innovation Services, says, "Veeco was determined from the beginning to find the right solution for our equipment needs. We were under an extremely aggressive installation timeline and Veeco's team partnered with us to meet our requirements. Their professional approach and superior process knowledge exceeded our expectations."

Vivek Vohra, Veeco's Vice President and General Manager, comments, "We are pleased Philips Innovation Services chose our system for their thin film device facility. We remain committed to delivering competitive products that meet our customers' specifications and look forward to providing excellent support and service to the Philips team."

Veeco's PVD technology enables the creation of MEMS and magnetic sensors with small form factors and increased capability. These systems offer improved accuracy and enable precise, uniform films with material flexibility for R&D or high-volume production.

The system is now qualified for operation at Philips Innovation Services' thin film device facility, supporting innovators in first-of-a-kind developments and small series production.

This forms part of the organisation's facilities (approximately 28,000 square metres), staffed with 950 technical experts including a wide variety of engineers and technologists.


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