+44 (0)24 7671 8970
More publications     •     Advertise with us     •     Contact us
*/
News Article

Element Six EUV capabilities sparkle

News

The firm says its synthetic diamond yields unrivalled performance in CO2 lasers

Element Six has expanded its high volume manufacturing capabilities of synthetic diamond optical windows, a critical component of Laser Produced Plasma (LLP) Extreme Ultraviolet (EUV) lithography systems.

The company made the announcement at SPIE Photonics West 2013.

Element Six has increased its Chemical Vapour Deposition (CVD) synthesis and processing total production capacity of synthetic diamond wafers by 50 percent at its U.S. location.

"EUV lithography represents a major technological advancement for next-generation semiconductor manufacturing, enabling sub 22 nm(1 x nm) technology nodes for both logic and memory devices," says Adrian Wilson, head of technologies at Element Six. "We believe Element Six's synthetic diamond optical windows are an accessible alternative to traditional optical materials, and the only commercially viable material to support LLP EUV lithography, reducing system downtime and improving wafer throughput."

Addressing system designers' most challenging and extreme specifications, Element Six grows large synthetic diamond windows (71-80mm in diameter) for high-power (20+kW) CO2 lasers, with larger diameters available for other optical applications.

The firm says, given its unique properties, synthetic diamond is the only material to withstand the power levels necessary for high-throughput EUV processing, thereby increasing the productivity and cost-efficiency of the systems. What's more, Element Six claims to develop the industry's flattest windows (PV < λ/20 at 633nm) to ensure less wavefront distortion and optimal system efficiency.

Element Six's synthetic diamond optical windows also deliver very low defect levels to ensure system performance is not compromised.

Overall, its patented CVD synthetic diamond offers a broad optical transmission spectrum, and high thermal conductivity and resistance to thermal shock, critical properties for high-demanding applications such as EUV.

As manufacturers ramp up EUV lithography capabilities, Element Six's high-volume manufacturing facilities in Silicon Valley, Ascot in the UK, and Cuijk in the Netherlands, should ensure the company meets customer requirements.

Element Six is a synthetic diamond supermaterials company and is a member of the De Beers Group, its majority shareholder.

The firm says its products are used in a variety of applications which include optics, power transmission, water treatment, semiconductors and sensors.

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: