Swiss R&D facility orders Veeco ion beam etch system
à‰cole Polytechnique Fédérale de Lausanne (EPFL) has ordered a Veeco NEXUS Ion Beam Etch (IBE) system.
The tool will be used for research and development projects in micro- and nano-fabrication at its Lausanne, Switzerland site.
Veeco's IBE systems are used to etch precise, complex features for high-yield production of discrete microelectronic devices and components.
Philippe Flueckiger, EPFL's Director of Operations comments, "Veeco has been well known as the top supplier of IBE technology for decades, so it was the clear choice for us. Ion Beam Etch is important in our micro- and nano-fabrication because we need the ability to accurately etch difficult to etch materials and multi-layer stacks used in today's emerging applications. Veeco's technology also provides us a level of precision in defining our structures not available with other dry etching techniques."
Vivek Vohra, Veeco's Vice President and General Manager, adds, "Given the growing trend of thin film based sensors being used in various consumer applications, we are very excited that our IBE technology has been selected by a new customer, EPFL, which is a top European research institution. We look forward to supporting their innovative research and industry collaborations."
Veeco's IBE and other technologies are used by customers for etching/depositing various thin films to produce micro electro mechanical systems (MEMS) and magnetic sensors.
