ASML qualifies Gigaphoton ArF Excimer laser for lithography
Lithography light source manufacturer Gigaphoton has received ASML acceptance and started shipment of the GT63A in January.
This is the next-generation ArF excimer laser for multi-patterning immersion lithography scanners.
The GT63A is another step in the continuing evolution of the Gigaphoton ArF platform. With its advanced twin-chamber architecture, laser output control algorithm and beam alignment technology, the GT63A provides lithography users reliability, superior maintenance recovery times and excellent module lifetimes.
The GT63A is compatible with the previously announced "s-Series" laser enhancements. These powerful GT63A features were designed in response to customers' requirements to advance existing ArF technology for stricter performance requirements and significant operational cost reductions.
These features include: sMPL (Spectrum Multi-Positioning LNM), the first customer approved spectrum control or "focus drilling" technology enabling greater depth of focus (DOF); sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a unique technology extending chamber module lifetimes; sTGM (Supreme Total Gas Manager), a gas management system eliminating routine chamber gas refills; and sMONITORING (Smart Monitoring), real-time information management tracking the highest laser stability in the market.
"The GT63A is another example of Gigaphoton's continued commitment to the Semiconductor Equipment industry and support of all our scanner vendor partners. This advanced ArF immersion technology, combined with demonstrated and significant reductions in electricity, gas and facility cooling resources, has raised the bar again for laser output performance, facility cost reductions and environmental sensitivity," says Hitoshi Tomaru, President and CEO of Gigaphoton, Inc.
"We look forward to continued product development and continuous improvement of our "green" initiative, EcoPhoton, 120W DUV power and EUV source development. Gigaphoton continues to invest in these technologies to advance lithography performance," continues Tomaru.
