Brewer Science lithography innovations still pushing the boundaries of Moore's law
Brewer Science, inventor of anti-reflective coatings for advanced lithography continues to push the limits of patterning technology with new innovative solutions in 2013.
Building on its strong expertise in material design, Brewer Science continues to deliver more versatile lithography technologies. The firm says its new generations of ARC and OptiStack® materials have set the industry standard for advanced lithography.
"Brewer Science is committed to providing flexible process solutions designed to fit each customer's specific requirements. This allows our customers to have a more cost-effective custom process and helps them reduce future risk by being able to quickly modify their process as business needs change," says Darron Jurajda, Director of Brewer Science's Semiconductor Business.
"In the past year, we have expanded our OptiStack materials platform to include materials for negative-tone development (NTD), extreme ultraviolet (EUV), and directed self-assembly (DSA) patterning," adds Jurajda.
Brewer Science strives to introduce innovative material solutions based on flexible platform designs to give customers competitive advantages and enable cost-effective device manufacturing.
Last year, the company successfully commercialised multiple OptiStack materials for NTD while making significant developments in OptiStack material platforms for EUV and DSA patterning. With this work, Brewer Science says it continues to fulfil its commitment to the industry by furthering Moore's Law through materials solutions.
"Looking to the future we will continue to innovate, work closely with customers and vendors, and push technology boundaries," says Terry Brewer, founder and CEO of Brewer Science. "Innovation is what the industry needs to make the big technology jumps required for the future, and Brewer Science is positioned to continue to play that important role in the supply chain. The successful products we have delivered through the years have been a result of the company's commitment to innovation, which will only increase."
Brewer Science will share its latest advancements at SPIE Advanced Lithography, taking place between February 24th to 28th, 2013, in San Jose, California, by presenting the following papers:
Paper: 8682-73 "¢ Tuesday, 26th February 2013 "¢ 6:00 PM-8:00 PM
Point-of-use filter membrane selection, start-up, and conditioning for low-defect photolithography coatings (Authors: Nickolas Brakensiek, Michael Cronin)
Paper: 8685-26 "¢ Tuesday, 26th February 2013 "¢ 6:00 PM-8:00 PM
Evaluating spin-on carbon materials at low temperatures for high wiggling resistance (Authors: Michael Weigand, Vandana Krishnamurthy, Yubao Wang, Qin Lin, Douglas Guerrero, Sean Simmons, Brandy Carr)
Paper: 8680-61 "¢ Wednesday, 27 February 2013 "¢ 6:00 PM-8:00 PM
Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning (Authors: Douglas J. Guerrero, Mary Ann Hockey, Yubao Wang, Eric Calderas)
The firm will be at booth #217 at SPIE Advanced Lithography.
