Lithography expert Bryan Rice named 2013 SPIE Fellow
Bryan J. Rice, on assignment from Intel Corporation as SEMATECH's director of Strategic Initiatives, was inducted as a 2013 Fellow by SPIE, the international society for optics and photonics, during its annual SPIE Advanced Lithography conferences in San Francisco, California.
Bryan J. Rice
Each year, SPIE Fellows are elected based on their significant scientific and technical contributions in optics, photonics, and imaging.
Rice received recognition for his achievements in technical and strategic leadership in the development of lithography. He was one of 69 Fellows elected to the society this year.
"SPIE's election of Bryan to Fellow demonstrates the significance of his achievements and is a testament to his leadership in the lithography community," says Dan Armbrust, SEMATECH president and CEO.
Before being named SEMATECH's director of Strategic Initiatives in 2011, Rice served as director of SEMATECH's Lithography program for three years.
Under his leadership, SEMATECH partnered with the College of Nanoscale Science and Engineering (CNSE) to launch the Resist and Materials Development Centre, a global EUV imaging resource, and the EUV Mask Infrastructure (EMI) Partnership which focuses on critical EUV tool development activities.
Rice also led SEMATECH's high-index immersion research in the search for high-refractive index lens and immersion fluid materials, and helped form the group's double-exposure program, which focused on the exploration of novel materials for the litho-litho etch patterning approach.
Prior to his assignment at SEMATECH, Rice worked with lithography tool manufacturers and EUV source suppliers in Intel's Components Research Division, to remove roadblocks to the development of EUV lithography technology.
Rice holds a doctorate in nuclear physics from Duke University as well as a bachelor's degree in physics and a master's degree in computer science from the Georgia Institute of Technology. He holds 16 U.S. patents and is the author of numerous publications on lithography and metrology.
As an active member of SPIE, Rice has authored and co-authored more than 30 papers, presented numerous papers and posters on current lithography issues, and contributed to selected chapters of books published by SPIE Press.
