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News Article

Versatile VERSALINE tool selected to etch MEMS devices

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The University of Southampton has selected a Plasma-Therm tool to provide deep silicon etching capability for the Southampton Nanofabrication Centre (SNC).

Housed in the Zepler Institute's new cleanroom facility, the institute also houses the Optoelectronics Research Centre. Together they provide research facilities for users from universities and industry, locally and internationally from a wide range of disciplines.

The centres also encourage commercialisation of internal and external research efforts managed by a dedicated university business unit.

The new VERSALINE DSE etching system will target silicon based applications that include MEMS and BioMEMS sensors, MOEMs, solar cells, and optical component devices. This expected diverse use requires system flexibility.

This led Iain Anteney, Cleanroom Manager to comment, "The VERSALINE's array of capabilities was an important part of the decision criteria. In addition to having broad process latitude to successfully etch many structures using an operating system that offered superior control, we were interested in process stability. The uniquely heated source and substrate temperature management strongly influenced our assessment."

John Davidson, Procurement Manager, adds, "We were pleased to see Plasma-Therm's focus on service support, partnership and quality construction. The company culture, competence, and attitudes were evident during our site visit. These things are not easily discernible or conveyed when reading a tender response."

David Lishan, Plasma-Therm Principal Scientist and Director, Technical Marketing notes, "We are pleased to have been selected by the SNC and look forward to a closely connected on-going relationship with another leading research institution. Centres such as SNC are playing critical roles in developing the sensors and optical devices that importantly influence how we interact with our world. At the rate technology is changing our world, being on the leading edge is definitely exciting and a welcome challenge."

 

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