Imec endorses Bruker's latest AFM tool
Bruker's new AFM will improve measurements in spatial resolution and repeatability in carrier profiling
Bruker has released the Dimension Icon SSRM-HR, pictured above.
The atomic force microscope (AFM) configuration includes a Scanning Spreading Resistance Microscopy (SSRM) module, designed specifically for high-resolution (HR) semiconductor characterisation.
Integrating Bruker's Dimension Icon AFM platform with an environmental control system capable of 1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system provides improved repeatability and spatial resolution in semiconductor carrier profiling.
As confirmed by Imec, buried gate oxide layers as thin as 5à… are detected routinely.
"As our customers continue to improve their products to follow the semiconductor roadmap, higher spatial resolution electrical characterization is a key requirement," says David V. Rossi, Executive Vice President and General Manager of Bruker's AFM Business.
"The new Dimension Icon SSRM-HR combines the leading productivity and large programmable stage of our top performance AFM platform with atomic resolution, and the most accurate carrier profiling optimisation to meet the specific demands of next-generation technology nodes."
"We chose Bruker because they offer the only solution that meets our needs," adds Vandervorst, Imec Fellow and Department Head, Materials and Components Analysis. "Our decision followed a rigorous evaluation of spatial resolution and repeatability in carrier profiling. Being at the forefront in tackling the roadblocks to continued technology scaling means we have the most stringent requirements."
