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Monday 7th October 2013
With conventional semiconductor manufacturing technology soon to reach its limit in the NAND Flash segment, suppliers of these memory chips are set to adopt 3D production techniques in order to boost the capacity of their devices
Monday 7th October 2013
Sales in the Americas showed a 23 percent increase compared to last August - the largest increase in all of the regions
Sunday 6th October 2013
Experiments may help in the design of new sources of extreme ultraviolet light for making integrated circuits with next generation lithography
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Thursday 3rd October 2013
Neely brings over 30 years of financial and operations management experience from major high-tech companies
Thursday 3rd October 2013
Now on the International Space Station, initial experiments verify Peregrine’s rad-hard RFIC regulates power and helps SpaceCube 2.0 deliver unprecedented on-orbit computing power
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Thursday 3rd October 2013
New large area i-PERC-type cells measuring 156 x 156mm2 achieve 20.5 percent average efficiency using nickel/copper plating on p-type Czochralski Silicon (Cz-Si) material
Thursday 3rd October 2013
Wafer shipments are forecast to remain flat in 2013 but increase in 2014 and 2015
Thursday 3rd October 2013
This move brings thermal expertise and innovative products to support expansion into new markets for Cascade Microtech
Wednesday 2nd October 2013
Simulations have helped North and South Dakota researchers decide which technology would make a better solar collector, quantum dot or nanowire
Wednesday 2nd October 2013
Using light waves instead of electrical wires for microprocessor communication functions could extend Moore's Law into the future
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Wednesday 2nd October 2013
The global electronic design innovator has been awarded for its design IP, 16nm FinFET and 3D-IC solutions
Wednesday 2nd October 2013
The Silicon Valley specialty foundry will initially offer semiconductor wet processes, etches and cleans, and resist spin coatings and films
Wednesday 2nd October 2013
 Innovative Micro Technology has taken on Paul Pickering to drive worldwide growth for MEMS
Tuesday 1st October 2013
The firm has achieved a stable 15W EUV output on a prototype system marking another step forward towards high power LPP light sources for EUV lithography
Tuesday 1st October 2013
A combination of galvanic isolation and small package provide high level of protection in industrial applications

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