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Saturday 4th March 2006
Xponent Photonics, technology innovator of FTTx optical components, announced that it has begun producing production volumes of Silicon Planar Lightwave Circuits (PLCs) at Innovative Micro Technology (IMT).
Thursday 2nd March 2006
Intel Corporation announced it will invest $300 million (US) to build a semiconductor assembly and test facility in Ho Chi Minh City.
Thursday 2nd March 2006
On the strength of its $26 million immersion tool, ASML maintained its lead in the $4.3 Billion Lithography Market, according to the report "Sub-100nm Lithography: Market Analysis and Strategic Issues," recently published by The Information Network.
Wednesday 1st March 2006
The equipment industry posted worldwide bookings of $5.14B in January 2006, according to VLSI Research Inc. Bookings increased 2% from December 2005.
Tuesday 28th February 2006
KLA Tencor Corporation and ADE Corporation jointly announced they have signed a definitive agreement for KLA-Tencor to acquire ADE Corporation.
Tuesday 28th February 2006
The present NAND flash memory glut is not destined to last very long—but even after the overage is resolved, the excess supply will continue to have a significant negative impact on pricing for another memory type: DRAM, according to iSuppli Corp.
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
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Monday 27th February 2006
IMEC announced the extension of its Europractice IC Service with the offering of UMC’s 90nm process technology.
Monday 27th February 2006
Leica Microsystems' Semiconductor Equipment Division has a new name: Vistec Semiconductor Systems.
Sunday 26th February 2006
Endveco Corporation, designer and manufacturer of instrumentation for vibration, shock and pressure measurement, announced a significant expansion and upgrade of its microelectromechanical systems (MEMS) production facility
Saturday 25th February 2006
One of the most advanced university cleanrooms in the world, the Nanofabrication Laboratory, at the Department of Microtechnology and Nanoscience, MC2, at Chalmers University of Technology, in Göteborg, Sweden, is now offering European Universities and SME's access free of charge to advanced micro- and nanotechnology fabrication resources.
Friday 24th February 2006
Fife-based semiconductor technology company Semefab is set to become the UK's primary centre for the design and development of micro machines and nanosystems, helping to drive major advances in medicine, drug discovery and defence.
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Thursday 23rd February 2006
Endveco Corporation, designer and manufacturer of instrumentation for vibration, shock and pressure measurement, announced a significant expansion and upgrade of its microelectromechanical systems (MEMS) production facility The one-year, $5-million effort will expand the company’s clean room and testing facilities in response to the growing use of MEMS technology.
Thursday 23rd February 2006
One of the most advanced university cleanrooms in the world, the Nanofabrication Laboratory, at the Department of Microtechnology and Nanoscience, MC2, at Chalmers University of Technology, in Göteborg, Sweden, is now offering European Universities and SME's access free of charge to advanced micro- and nanotechnology fabrication resources.
Thursday 23rd February 2006
Fife-based semiconductor technology company Semefab is set to become the UK’s primary centre for the design and development of micro machines and nanosystems, helping to drive major advances in medicine, drug discovery and defence.
Thursday 23rd February 2006
Nanotecture Ltd, nanotechnology material company, announces that it has been awarded a £374.6K grant by the UK's DTI, to support a two-year research and development project entitled "Next Generation Super-capacitors for Hybrid Vehicle Applications".
Wednesday 22nd February 2006
Nanotecture Ltd, nanotechnology material company, announces that it has been awarded a £374.6K grant by the UK’s DTI, to support a two-year research and development project entitled “Next Generation Super-capacitors for Hybrid Vehicle Applications”.
Wednesday 22nd February 2006
SEMATECH North researchers working on extreme ultraviolet lithography (EUVL) have achieved an important breakthrough in the complex process of cleaning mask blanks, the base material for the stencil-like photomasks that are used to describe patterns on semiconductor wafers.

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