Info
Info
News search:

< Page of 406 >

News


Thursday 23rd February 2006
One of the most advanced university cleanrooms in the world, the Nanofabrication Laboratory, at the Department of Microtechnology and Nanoscience, MC2, at Chalmers University of Technology, in Göteborg, Sweden, is now offering European Universities and SME's access free of charge to advanced micro- and nanotechnology fabrication resources.
Thursday 23rd February 2006
Fife-based semiconductor technology company Semefab is set to become the UK’s primary centre for the design and development of micro machines and nanosystems, helping to drive major advances in medicine, drug discovery and defence.
Thursday 23rd February 2006
Nanotecture Ltd, nanotechnology material company, announces that it has been awarded a £374.6K grant by the UK's DTI, to support a two-year research and development project entitled "Next Generation Super-capacitors for Hybrid Vehicle Applications".
Wednesday 22nd February 2006
Nanotecture Ltd, nanotechnology material company, announces that it has been awarded a £374.6K grant by the UK’s DTI, to support a two-year research and development project entitled “Next Generation Super-capacitors for Hybrid Vehicle Applications”.
Wednesday 22nd February 2006
SEMATECH North researchers working on extreme ultraviolet lithography (EUVL) have achieved an important breakthrough in the complex process of cleaning mask blanks, the base material for the stencil-like photomasks that are used to describe patterns on semiconductor wafers.
Wednesday 22nd February 2006
SEMATECH North researchers working on extreme ultraviolet lithography (EUVL) have achieved an important breakthrough in the complex process of cleaning mask blanks, the base material for the stencil-like photomasks that are used to describe patterns on semiconductor wafers.
Info
Tuesday 21st February 2006
Freescale and STMicroelectronics, are teaming up to establish a wide-ranging initiative to reinforce their respective strengths in automotive applications.
Tuesday 21st February 2006
SUSS MicroTec, supplier of precision manufacturing equipment for the semiconductor and emerging markets, announced the installation of an additional wafer bonding system at Innovative Micro Technology.
Tuesday 21st February 2006
JSR Corporation of Tokyo, and its US operations, JSR Micro, Inc., announced that it has, through a long-standing partnership with IBM, further advanced the viability of immersion lithography by successfully demonstrating sub-30nm patterning.
Tuesday 21st February 2006
Freescale and STMicroelectronics, are teaming up to establish a wide-ranging initiative to reinforce their respective strengths in automotive applications. The two companies will create a joint microcontroller design team, align process technologies and share intellectual property, including high-power MOS technologies
Monday 20th February 2006
UK Trade & Investment will be leading a delegation of pioneering UK nanotechnology organisations at the flagship nano tech 2006 event, taking place in Tokyo next week.
Monday 20th February 2006
Freescale Semiconductor is simplifying product development for embedded networking and graphical user interface (GUI) systems with a suite of open source development tools for its MCF532x and MCF537x ColdFire device families.
Info
Monday 20th February 2006
SUSS MicroTec, supplier of precision manufacturing equipment for the semiconductor and emerging markets, announced the installation of an additional wafer bonding system at Innovative Micro Technology.
Sunday 19th February 2006
KLA-Tencor unveiled its next-generation photomask inspection system, STARlight-2, providing wafer fabs with a cost-effective contamination inspection solution for all types of photomasks, including mainstream extreme resolution enhancement technique (XRET) photomasks, at the 65-nm node and below.
Sunday 19th February 2006
The Micromanipulator Company, is pleased to introduce our new 300mm WLR reliability probe station, the 2200-US12-V0.
Sunday 19th February 2006
JSR Corporation of Tokyo, and its US operations, JSR Micro, Inc., announced that it has, through a long-standing partnership with IBM, further advanced the viability of immersion lithography by successfully demonstrating sub-30nm patterning.
Saturday 18th February 2006
Semico’s IPI guide model of prediction holds good news for the forth coming semiconductor industry projection for 2006, indicated with a 17.3% annual revenue growth rate. It is anticipated that on a geographical scale momentum will be generated from a good end of year round up from 2005 figures.
Saturday 18th February 2006
Applied Materials, Inc. announced that it has shipped its 500th 300mm CMP (chemical mechanical planarization) system.
Info
Saturday 18th February 2006
UK Trade & Investment will be leading a delegation of pioneering UK nanotechnology organisations at the flagship nano tech 2006 event, taking place in Tokyo next week.
Friday 17th February 2006
Image Technology, supplier of 1X full-field photomasks, announced that it has acquired a Lasertec Large Area Mask (LAM) defect inspection tool to enhance their full production line for advanced 9-inch photomasks.
Friday 17th February 2006
mPhase Technologies Inc. announced the promotion of its lead nanotechnology researcher Victor Lifton, to the position of Chief Scientist, with a larger responsibility for the company's emphasis on "small" technology - including the company's "smart" nano-structured battery and ultra-sensitive uncooled magnetometer.
Friday 17th February 2006
Freescale Semiconductor is simplifying product development for embedded networking and graphical user interface (GUI) systems with a suite of open source development tools for its MCF532x and MCF537x ColdFire device families.
Thursday 16th February 2006
Scientists at Philips Research have created a fully functional 13.56 MHz RFID tag based entirely on plastic electronics.
Thursday 16th February 2006
SanDisk Corporation announced the United States International Trade Commission (ITC) has instituted an investigation in response to a complaint filed by SanDisk.

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
×
Logo
×
Register - Step 1

You may choose to subscribe to the Silicon Semiconductor Magazine, the Silicon Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in:
 
X
Info
X
Info