Levitor Picks Up New Application
This is a recently developed application for the Levitor system. Up to now, Levitor has largely been used for implant anneal processes in the 900-1100C temperature range.
Launched in 2000, Levitor is based on a floating wafer principle - a wafer, confined between two massive hot blocks, is heated through conduction. A gas layer between the wafer surface and reactor blocks self-centres the wafer and keeps it floating without any support. The 0.15mm thick gas enables uniform, ultra fast heating with rates up to 900C/s.
Ernst Granneman, business unit manager of ASM's RTP business, says: "This new application demonstrates that the Levitor system features (high heat-up rates and intrinsic temperature stability) are ideal for low-temperature applications, particularly below 400C, a range that is normally not accessible for conventional lamp-based heating systems."
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