Surfactant ready for sale
The technology is designed to deal with the capillary effect that can cause photoresist patterns to collapse during the image developing process. The capillary effect results from liquid surface tension and is particularly seen in narrow tubes and channels. This causes problems when photoresist images become increasingly small with aspect ratios increase beyond 3:1.
In the project, TEL primarily handled material evaluation and process development while Clariant mainly carried out the surfactant development. TEL has used the surfactant to ready its CLEAN TRACK lithography image development equipment for 90nm mass production.
Supercritical fluid processing is another proposed method for suppressing pattern collapse in cleaning. The companies say that in comparison their new process is enabled through a simple modification of existing equipment. Supercritical fluid systems would need to add high pressure handling systems.
Major semiconductor manufacturers are evaluating the TEL/Clariant product. Joint development is to conclude by the end of the year and extension to 55nm patterns has already been verified. Plans call for TEL to market and provide rinse supply hardware and process optimisation and for Clariant to manufacture the rinse solution.
