Litho-cluster link between TEL and ASML
The companies plan to improve imaging performance and litho-cluster productivity to 150 wafers per hour. Current state-of-the-art photolithography equipment employs both coater/developers and scanners as loosely coupled individual tools with many processes that are independently optimised.
The companies will work in joint development programmes to identify, formulate and develop solutions for litho-cluster challenges in current and next generation lithography, including high-NA ArF (193nm), immersion ArF and F2 (157nm).
The litho-clusters will be based on TEL's coater/developer, the Clean Track Lithius, Clean Track Act 12 and Clean Track Act 8 and ASML's Twinscan exposure system. The exchange will enable litho-cluster customer demonstrations, qualification and development. TEL and ASML will have the first results and demos available in H2 2004.
TEL is the technology leader for coater/developers. ASML provides lithography exposure systems. ASML announced a similar litho-cluster programme last week with Dainippon Screen Manufacturing, also a Japanese company (Bulletin 507, November 19, 2003).
